Oxford Instruments Launches 2010 Seminars
15-16th July 2010
New Frontiers in Plasma Nanopatterning Hosted by The Molecular Foundry, Lawrence Berkeley National Laboratory, CA, USA
27-28th September 2010
Dry processing for Nanoelectronics and Micromechanics: growth, deposition and etching Hosted by University of Freiburg/IMTEK, Germany
The company is planning to hold a Seminar/Workshop in the UK, date to be confirmed.
Programmes are available , so to find out more about each seminar and/or to register for a place email: plasma@oxinst.com
Oxford Instruments' etch, deposition and growth systems provide process solutions for the micro- and nanometre engineering of materials for semiconductor, optoelectronics, MEMS & microfluidics, high quality optical coating and many other applications in micro- and nanotechnology.
To find out more about Oxford Instruments Plasma Technology's process and product offering see www.oxford-instruments.com
The 13th CS International conference builds on the strengths of its predecessors, with around 40 leaders from industry and academia delivering presentations that fall within five key themes: Ultrafast Communication; Making Headway with the MicroLED; Taking the Power from Silicon, New Vectors for the VCSEL, and Ultra-wide Bandgap Devices.
Delegates attending these sessions will gain insight into device technology, find out about the current status and the roadmap for the compound semiconductor industry, and discover the latest advances in tools and processes that will drive up fab yields and throughputs.
To discover our sponsorship and exhibition opportunities, contact us at:
Email: info@csinternational.net
Phone: +44 (0)24 7671 8970
To register your place as a delegate, visit: https://csinternational.net/register
Register
