Brooks Instrument`s new MFCs ideal for high purity LEDs
The company is introducing three new MFCs which are suited to LED wafer growth. Brooks has also set up a new technology development centre in Irvine, Californi
Brooks Instrument, a provider of advanced flow, pressure, vacuum, level and vapour delivery solutions, has expanded its commitment to the semiconductor industry with four new products.
The new products include the GF135 advanced diagnostic mass flow controller (MFC) and three MFCs for high-flow applications.
These MFCs, which expand Brooks’ GF100 Series product line for semiconductor processing applications, are all built on a common platform and interface, enabling an entire system to use one product platform.
“Brooks continues to provide innovative solutions for the semiconductor industry by expanding its portfolio of advanced technology products,” says Bill Valentine, chief technology officer for Brooks Instrument. “Our strategic focus for the technology centre will be to strengthen our relationships with semiconductor end users and equipment manufacturers so we can translate customer needs into product requirements.”
The GF135 delivers game-changing technology because it is the first “smart” pressure transient insensitive (PTI) MFC that can perform self diagnostics - including integral rate-of-decay flow measurement - without stopping the flow of process gas.
Semiconductor manufacturers can now verify accuracy, check valve leak-by, and monitor sensor drift in real time without removing the flow controller from the gas line. This new diagnostic technology allows for uninterrupted production of wafers and thousands of dollars in potential daily cost savings.
The GF101, GF121 and GF126 are high-flow thermal MFCs that are ideal for process engineers in LED and semiconductor process and purge applications who require high purity and flow rates up to 300 slpm. Brooks says these MFCs deliver superior accuracy, response time and reliability versus the competition as well as having a smaller footprint.