Loading...
News Article

Sanan qualifies Aixtron Reactor for Deep UV LED production

News

Novel process chamber design enables enhanced fabrication of high performance deep UV LEDs

Semiconductor equipment company Aixtron has announced that Chinese optoelectronics manufacturer San'an has successfully completed the qualification of Aixtron's novel Close Coupled Showerhead (CCS) process chamber designed for the production of deep UV (DUV) LEDs.

The new process chamber is based on Aixtron's CCS technology. It is said to be the first commercially available MOCVD reactor that offers the high process temperatures as needed for the production of DUV LEDs.

The enhanced chamber performance is designed for cost-efficient high volume manufacturing of DUV LEDs as used for water and air purification. The configuration of 19 x 2-inch wafers represents the largest capacity currently available in the market for this high end MOCVD application.

Ryan Chuo, VP of Technology Centre, San'an Optoelectronics, comments: "The new Aixtron CCS reactor design is a key enabling factor for San'an producing next generation DUV LED products with higher quantum efficiencies and significantly higher output powers. Already being one of the largest suppliers for LEDs, Aixtron's newly designed process chamber perfectly supports our strategic targets in the area of DUV LEDs to further strengthen our industry leadership. Therefore, we are very pleased to be the first company to qualify and utilise Aixtron's new reactor kit."

Say hello to the heterogeneous revolution
Double heterostructure HEMTs for handsets
AlixLabs to collaborate with Linköping University
SiC MOSFETs: Understanding the benefits of plasma nitridation
Wolfspeed reports Q2 results
VueReal secures $40.5m to scale MicroSolid printing
Mitsubishi joins Horizon Europe's FLAGCHIP project
Vishay launches new high voltage SiC diodes
UK team leads diamond-FET breakthrough
GaN adoption at tipping point, says Infineon
BluGlass files tuneable GaN laser patents
QD company Quantum Science expands into new facility
Innoscience files lawsuit against Infineon
Riber revenues up 5% to €41.2m
Forvia Hella to use CoolSiC for next generation charging
Photon Design to exhibit QD simulation tool
Ortel transfers CW laser fabrication to Canada
Luminus adds red and blue multi-mode Lasers
PseudolithIC raises $6M for heterogeneous chiplet tech
Mesa sidewall design improves HV DUV LEDs
IQE revenue to exceed expectations
'Game-changing' VCSEL system targets clinical imaging
German start-up secures finance for SiC processing tech
Macom signs preliminaries for CHIPS Act funding
IQE and Quintessent partner on QD lasers for AI
EU funds perovskite tandems for fuel-free space propulsion
EU to invest €3m in GeSi quantum project
Transforming the current density of AlN Schottky barrier diodes
Turbocharging the GaN MOSFET with a HfO₂ gate
Wolfspeed launches Gen 4 SiC MOSFET technology
Report predicts high growth for UK's North East
Element Six unveils Cu-diamond composite
×
Search the news archive

To close this popup you can press escape or click the close icon.
Logo
x
Logo
×
Register - Step 1

You may choose to subscribe to the Compound Semiconductor Magazine, the Compound Semiconductor Newsletter, or both. You may also request additional information if required, before submitting your application.


Please subscribe me to:

 

You chose the industry type of "Other"

Please enter the industry that you work in:
Please enter the industry that you work in: