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Multiplex ramping up production of InP based Lasers and Detectors - Two AIX 2400G3 MOVPE system recently purchased

Source: Aixtron AG

Multiplex Incorporated, a high technology company based in South Plainfield, New Jersey, has decided to increase its production capacity for InP based lasers, detectors and several other optoelectronic devices by adding two AIX 2400G3 Planetary Reactorsâ to its existing AIXTRON MOCVD tool. Multiplex will use the new reactor for the growth of advanced epitaxial layers applied in 10 Gb/s product families. The large experience of Multiplex s R&D and manufacturing departments in the field of InP/GaInAsP MOCVD for telecommunication applications enforced the decision for the AIX 2400G3 production platform as a straightforward route to further strengthen the company s position in the optical communication market.

Dr. W. Tsang, Multiplex President/CEO, said: "We are convinced the AIX 2400G3 is the ideal tool for us, combining high flexibility for R&D purposes with excellent uniformity data and high efficiency which is especially relevant for the production of InP based devices. On top of this, Multiplex has already accumulated tremendous manufacturing experience using AIXTRON reactors in the production." "The AIX 2400/2600G3 for InP applications is a very successful tool for the fabrication of lasers and detectors. Nearly all important manufacturers of InP based optoelectronics have decided to use this MOCVD platform. Among these customers are for example Agilent, Alcatel, Anritsu, I.Q.E., JDS-Uniphase, Lucent Technologies, Mitsubishi Electric, Nortel and Sumitomo", commented Dr. Juergensen, president of AIXTRON.

The AIX 2400/2600G3 has a flexible design for up to 35x2 inch and 5x6 inch wafers. The two-flow horizontal Planetary Reactor® is recognized as the most widely used multiwafer MOCVD reactor for compound semiconductor applications. The reactor concept allows laminar gas flow without turbulences for precise control of the material composition and achievement of ultra-sharp interfaces. Ultra-high uniformity along with high growth efficiency on multiple 2, 3, 4 or 6 inch wafers is achieved through wafer rotation with the patented Gas Foil Rotation®.

AIXTRON offers a wide range of epitaxial systems for MOVPE, VPE and LPE from R&D-orientated systems up to large-scale Planetary Reactor® production systems for up to 25x4 inch or 9x6 inch wafers. The company has sold over 500 systems worldwide, provides an extensive service and support network for maintenance and upgrading and is represented in over 15 countries. Among AIXTRON s list of further industrial clients are names such as Agere (formerly Lucent), Agilent/LumiLeds, Alcatel, Anritsu, AXT, Epistar, Epitronics, EPSON, Honeywell, IQE, ITT, JDS-Uniphase, Kopin, Mitsubishi Electric, Motorola, Nortel, Osram, Samsung, Siemens, Showa Denko, Sumitomo Electric, Thales, UEC, VPEC and numerous Japanese corporations. AIXTRON systems have also been installed in many of the world s most renowned research institutes including JPL, Sandia Nat. Lab., Fraunhofer Institute, ITRI-OES, CNRS. AIXTRON is very active in advancing MOCVD technology through collaborations and joint R&D projects with major partners worldwide.

Contact: Octavia Schirmer Aixtron AG Tel: +49 (241) 8909-474 Fax: +49 (241) 8909-40 E-mail: ocs@aixtron.com

 

Octavia Schirmer
Aixtron AG
Tel: +49 (241) 8909-474
Fax: +49 (241) 8909-40
E-mail: ocs@aixtron.com
 
E-mail: ocs@aixtron.com
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