Technical Insight
JMAR Awards Contract to SAL for X-Ray Lithography Stepper (Materials and Equipment)
JMAR Technologies has awarded a contract to SAL (South Burlington, VT) worth more than $1.0 million to construct an X-ray lithography system. The XRS 2000 NanoPulsar system will be powered by JMAR s PXS-125 laser plasma X-ray source. In addition, the system will include a collimator developed by X-Ray Optical Systems (Albany, NY) to direct the X-rays onto the mask/wafer target. "The completed NanoPulsar system is expected to achieve better than 130 nm resolution," said John Carosella, president of JMAR s NanoLight division. "JMAR and SAL are targeting markets such as the high speed GaAs semiconductor devices used in advanced telecommunications, which require critical dimensions ranging from 130 nm to 70 nm."
