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News in brief: TI’s strained silicon, FEI and Avalon

TI has reported 50% improvements in transistor performance using strained silicon, FEI has opened a new campus and Avalon has achieved ISO 9001 certification.
TI reports 50% improvement using strained silicon

Texas Instruments has raised the performance of its conventional CMOS transistors by 50% through the use of strained silicon, according to a report in Electronics News.

TI has implemented strained silicon in its first 90 nm process, which will be see its first implementation in products built for Sun Microsystems. Sun expects to ship its UltraSparc 64-bit processor in the second half of 2004.

FEI opens new headquarters campus

FEI Company, a manufacturer of metrology equipment, has opened its World Campus and Headquarters in Hillsboro, Oregon.

The 27-acre campus consolidates the company’s local Oregon operations at one site and features two buildings, one for offices and the other for R&D and manufacturing.

The site also includes FEI’s new Product and Technology Solutions Center, which will allow customers and researchers to access the company’s latest products for managing advanced nanoscale research and technologies.

Avalon wins ISO 9001 certification

Avalon Photonics, a manufacturer of VCSELs based in Zurich, Switzerland, has achieved ISO 9001 certification.

"The ISO 9001 certification also assures that our extensive know-how in Telcordia qualification of our high reliability datacom VCSELs is systematically applied to our sensing and measurement products," said Karlheinz Gulden, Avalon s CTO.

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