News Article

SPIE Lithography Asia Will Draw Top Lithographers To Taiwan

Semiconductor and flat-panel display industry leaders from around the world will discuss the latest developments in lithography techniques for semiconductor and FPD manufacturing at the annual SPIE Lithography Asia conference in Taiwan this month.

Dates are 18 and 19 November at the Sheraton Taipei Hotel.

Taiwan is a natural location for the conference. A major portion of the

world s microelectronics and FPD products are manufactured in Asia and

an increasing segment of R&D for lithography processes and equipment

technology have moved to Asia as well, as semiconductor and FPD

industries have expanded globally over the past several decades.

Among featured presentations by leading researchers, developers, and

innovators are four plenary talks:

*         Kinam Kim of Samsung Electronics, on the future of the silicon


*         Cheng-Wen Wu of Industrial Technology Research Institute, on

the designer s perspective on 3D integration

*         Burn J. Lin of Taiwan Semiconductor Manufacturing Co., on the

contrast and challenges between photon and electron beam patterning


*         Christopher J. Progler of Photronics, Inc., on mask technology

and timing for IC and LCD applications.

Lin is one of four conference chairs, along with Alek Chen of ASML

Taiwan, Woo-Sung Han of Samsung Electronics, and Anthony Yen of Taiwan

Semiconductor Manufacturing Co.

More than 100 technical papers will be presented, and an evening welcome

reception will include a poster session.

Best student paper awards sponsored by ASML and Cymer will be awarded.

Other meeting sponsors are Sokudo, Mentor Graphics, Entegris, and Tokyo

Electron. The Taiwan Semiconductor Industry Association is a cooperating


See the SPIE Lithography Asia

event website for more information.

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