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Obducat receives order for Nano Imprint Lithography (NIL) system from CNRS

System to be installed at the largest innovation centre for micro- and nanotechnology of Europe
The Eitre 6 will be installed in the Plateforme Technologique Amont (PTA) clean room at the MINATEC campus, part of the Centre National de la Recherche Scientific (CNRS) in Grenoble. The machine will offer imprint areas of up to 6" and be used for research in nanoelectronics and photonics.

The ordered model will have a number of options apart from the standard features and will comprise a complete range of imprint methods, including thermal NIL, hot embossing, UV NIL, as well as Obducat s proprietary Simultaneous Thermal and UV imprint process.

The Eitre range is suitable for Research & Development purposes and allows replication of patterns in the micro- and nanometer range. It has a proprietary design of the heater, embedded in the substrate chuck, which provides a homogeneous temperature distribution across the whole imprint area. The uniform heating and a wide range of temperature settings, makes it possible to use a wide range of imprint polymer.

"We are very proud that the renowned research community at MINATEC now will have access to our NIL technology. It s a very prestigious order" said Lars Tilly, CEO of Obducat.

 
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