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Oxford Instruments Hails Plasma Workshop A `great Success`

Presentations included talks on Atomic Layer Deposition process and applications, an overview of plasma etch, PECVD & TEOS processes & nanoscale applications
The first workshop organised by Oxford Instruments Plasma Technology at MIT’s Microsystems Technology Laboratories (MTL), Cambridge, Massachusetts in December was attended by a wide audience. 

It addressed the latest research and technologies in plasma etch and deposition, via technical presentations and discussions focussing on latest innovations, as well as a networking lunch.

Vicky Diadiuk, Associate Director, Operations, at MTL, comments, " This was an excellent workshop, and the talks presented a huge amount of very useful information, allowing our students and researchers to learn more about Atomic Layer Deposition and plasma processing from the experts, while also attracting participants from the wider technical community. Many of the attendees have reached out to tell me how much they learnt about the processes discussed. I think this is a really good way for Oxford Instruments to highlight the expertise of its staff."

“We’ve been hosting these successful seminars worldwide for several years, and were delighted that such recognised speakers as Prof. Erwin Kessels, Technical University Eindhoven and Vince Genova, Cornell University agreed to participate. Their input, together with talks from our own specialists combined to make an informative and interesting day", adds Stuart Mitchell, VP Sales for Oxford Instruments America Inc.

“These workshops provide an ideal opportunity for academic and industrial technologists to network and share ideas, and we are delighted to have held this joint workshop with the Microsystems Technology Laboratories," adds Mitchell.

Presentations included talks on Atomic Layer Deposition (ALD) process and applications; an overview of plasma etch, PECVD & TEOS processes, as well MEMS & nanoscale applications.

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