News Article
Veeco to reveal compact MBE tool
The company says its latest molecular beam epitaxy reactor is the industry’s first integrated MBE System for the compound semiconductor R&D market
Veeco Instruments has introduced the GENxplor Molecular Beam Epitaxy (MBE) deposition system.
The GENxplor can create high quality epitaxial layers on substrates up to 3” in diameter and is ideal for cutting edge research on a wide variety of materials including GaAs, nitrides, and oxides.
Latest GENxplor R&D MBE System
“The compound semiconductor R&D community asked for a more affordable, flexible, and easy-to-use MBE system and Veeco has delivered with the GENxplor,” says Jim Northup, Veeco’s Vice President and General Manager. “We have repackaged Veeco’s industry-leading MBE technology into a novel ‘all-in-one’ design that combines the reactor and electronics on a single frame. It will change the way researchers use MBE.”
The GENxplor uses Veeco’s GEN10 growth chamber design and features process flexibility, ideal for materials research on emerging technologies such as UV LEDs, high-efficiency solar cells, and high-temperature superconductors.
Its efficient single frame design combines all vacuum hardware with on-board electronics to make it up to 40 percent smaller than other MBE systems, saving valuable lab space. And as the manual system is integrated on a single frame, installation time is reduced.
Veeco says the open architecture design of the GENxplor also improves ease-of-use and provides convenient access to effusion cells. And it also allows easier serviceability when compared to other MBE systems. When coupled with Veeco’s recently introduced retractable sources, the system is ideally suited to oxide materials research.
Veeco will be launching the GENxplor at this week’s China MBE Conference in Shanghai.
