News Article
Avantor to showcase new cleaning chemistries at SEMICON West
NMP-free organic film stripper for LEDs
Avantor Performance Materials will be showing a number of new products for photoresist and post-etch residue removal during SEMICON West 2014 in San Francisco next week. These include the new J.T.Baker ALEG-368 NMP-free organic film stripper and residue remover for LED applications
For lines, via, and bond pad cleaning, ALEG-368 is developed for technologies containing aluminum interconnects. The ALEG-368 formulation removes ash residue, sidewall polymers, and bulk photoresist, and is NMP-free in response to environmental and regulatory concerns.
The ALEG-368 material supports the integration of Environmental, Health, and Safety (EH&S) roadmaps, and allows for process optimisation and cost reduction programs.
For lines, via, and bond pad cleaning, ALEG-368 is developed for technologies containing aluminum interconnects. The ALEG-368 formulation removes ash residue, sidewall polymers, and bulk photoresist, and is NMP-free in response to environmental and regulatory concerns.
The ALEG-368 material supports the integration of Environmental, Health, and Safety (EH&S) roadmaps, and allows for process optimisation and cost reduction programs.
