Products

Multi-layer deposition system for manufacture

AFTEX-6000series

Solid-source ECR plasma deposition system that makes it possible to form multi-layer films from a large number of materials.

  • Low temperature process
  • High refractive index control
  • High-speed reactive film formation
  • Multilayer film

A solid-source electron cyclotron resonance (ECR) plasma deposition system forms high-quality thin films by directly reacting a low-pressure, high-density ECR plasma flow with particles sputtered from a solid source (target) placed at the outlet of the plasma flow. AFTEX-6200 is equipped with two ECR plasma sources and enables automatic transfer and deposition, which is optimal for multilayer film deposition.

  • Deposition Characteristics
  • Product Features
  • Standard Specification
  • Principles and Features of ECR Plasma Deposition
Deposition Characteristics
Product Features
Standard Specification
Principles and Features of ECR Plasma Deposition

Drawing & Diagram



Contact Us

TEL 045-787-7203 / FAX 045-787-8472

Please feel free to contact us, you can reach us with phone or thru contact form here.


Contact Us