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HexaTech launches 3-inch AlN substrate product

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Targets commercial-scale production of AlN-based technologies

HexaTech, a subsidiary of the Japanese firm Stanley Electric, has announced the immediate production release of its new 3-inch (76.2 mm) diameter single crystal AlN substrate product.

Three-inch diameter substrates are seen as a key transition milestone toward the realisation of 100 mm diameter material, supporting future high-volume production of AlN-based high voltage and high frequency electronic devices.

“With this 3-inch launch, HexaTech continues to build on its history of delivering AlN material with industry-leading structural and surface quality, retaining the same macroscopic defect-free performance we have been producing for many years with our existing 2-inch platform,” remarked HexaTech manager of research and development Rafael Dalmau.

Gregory Mills, HexaTech VP of business development noted: “HexaTech continues to drive increased value by delivering superior quality alongside reduced price per unit area to our customers. This accelerating trend will enable our customers to quickly transition from device research into production.”

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