News Article
Crystal IS achieves 99% usable area on 100 mm AlN
Improved wafer quality based on specification for UVC LEDs
Crystal IS, an Asahi Kasei company, has announced the successful serial production of 100 mm diameter single-crystal aluminum nitride (AlN) substrates with 99 percent usable area, based on current requirements for UVC LEDs, with manufacturing to take place in the United States.
Pictured above is a comparison of Crystal IS 100 mm bulk aluminum nitride substrate from CY24 Q1 (left) with 90 percent usable area and CY24 Q2 (right) with 99.3 percent usable area.
“The improvement of our large diameter substrate quality over the last nine months showcases the expertise of our team in crystal growth,” said Eoin Connolly, president and CEO of Crystal IS. “The inherent thermal benefits of AlN can enable higher performing RF and power devices in mission critical and telecom applications—we are excited to work with our partners to further develop this material to meet their needs.”
This achievement follows the company’s announcement of the first-ever recorded 100 mm diameter in August 2023, which won the Grand Prize in the category of Electronic Materials for Semiconductors in the 2024 Semiconductor of the Year Awards. The Semiconductor of the Year Awards are organised by Electronic Device Industry News, an industry journal published in Tokyo by Sangyo Times, Inc.
Crystal IS manufactures bulk single crystal AlN substrates at its headquarters in Green Island, New York, and began selling 2-inch diameter substrates for research and development in RF and power devices in late 2023. This 100 mm diameter milestone accelerates the development of new applications on
AlN substrates as it integrates into existing fabrication lines for RF and power devices using alternative materials.
The company plans to offer 100 mm diameter substrates, which will be exclusively manufactured in its US facility, to key partners this year as they continue to expand beyond UVC LEDs.
