Furukawa selects Aixtron MOCVD system
Aixtron AIX 2800G4 system to support development of GaAs and InP based optoelectronics in Japan
Deposition equipment firm Aixtron has received an order for an AIX 2800G4 MOCVD System from Furukawa Fitel Optical Device Co., Ltd, a Japan based manufacturer of compound semiconductor devices.
The equipment will be used for the development and the production of optoelectronic devices, based on GaAs and InP materials.
The AIX 2800G4 platform uses the Planetary Reactor concept to control the thickness and wavelength uniformity of epitaxial layers. Designed for high volume manufacturing, the system is said to provide the highest efficiency in the use of chemicals while delivering superior yields for most advanced optical devices thanks to wafer level process control.
"We are very pleased to see Furukawa becoming one of our G4 users. The platform is the reliable and established industry standard for most demanding epitaxial requirements and has contributed to the success of many customers. With our team of hardware and process experts in Japan, we are looking forward to this new cooperation, supporting Furukawa to swiftly ramp up the platform for their existing and future products," says Felix Grawert, CEO and president of Aixtron SE.
