Applied Materials and Fraunhofer IPMS launch metrology hub
New hub aims to accelerate semiconductor research and enhance development projects
Applied Materials, and the Fraunhofer Institute for Photonic Microsystems IPMS, have announced a collaboration to create Europe´s largest technology hub for semiconductor metrology and process analysis.
To be located at the Center Nanoelectronic Technologies (CNT) of Fraunhofer IPMS in Dresden, the technology hub is situated in the heart of Silicon Saxony, Europe’s largest semiconductor cluster. The hub will be equipped with Applied Materials’ eBeam metrology equipment, including its VeritySEM CD-SEM (critical dimension scanning electron microscope) systems, and staffed by Applied engineers and R&D experts.
“Fraunhofer IPMS and its partners will benefit from access to Applied’s industry-leading eBeam metrology systems”, said Benjamin Uhlig-Lilienthal, Head of Business Unit Next Generation Computing at Fraunhofer IPMS. “The new technology hub will offer advanced wafer-level metrology in our industrial CMOS environment with Fraunhofer IPMS’s unique ability to loop wafers directly with semiconductor manufacturers.”
“Our collaborative metrology hub will accelerate learning cycles and the development of new applications for the Fraunhofer Institute, Applied Materials and our customers and partners in Europe,” said James Robson, corporate VP for Applied Materials Europe. “This unique technology hub will have the capability to test and qualify processes on a variety of substrate materials and wafer thicknesses critical to applications across the diverse European semiconductor landscape.”
