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University of Illinois to get Samco plasma etching system


Small footprint fully automatic reactive ion etching system latest upgrade for Materials Research Lab

Samco will be installing a plasma etching system RIE-10NR early in 2024 as the newest update to the Materials Research Lab (MRL) at the University of Illinois Urbana-Champaign (UIUC).

The MRL facility has two Class-100 clean rooms totalling 1,900 square feet with instrumentation for micro/nano-fabrication projects including wet and chemical etching, deposition, spin coaters, mask aligners, optical, 3D and electron beam lithography. The RIE-10NR, a compact, fully automatic reactive ion etching system, is the latest equipment upgrade. The tool can etch various materials including Si, SiO2, SiN, Poly-Si, GaAs, Mo, Pt, and Polyimide.

Director of research facilities at University of Illinois Urbana-Champaign’s MRL, Mauro Sardela commented: “We are hoping to upgrade our RIE capabilities to better support our base of more than 1,000 users. We hope to provide state-of-the-art etching uniformity in our test devices, combined to easy-to-use interface for our various students.”

Tsukasa Kawabe, president and COO of Samco, said: “Here at Samco, we specialise in making systems like the RIE-10NR, which has an exceptionally small footprint, is cost-effective, boasts exceptional reliability, and benefits from more than three decades of continuous improvements. We are always looking for ways to add value to both the world and for our clients.”

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