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Trymax wins order from Chinese CS foundry

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NEO 2000 Series plasma tool chosen to perform photoresist ashing and descum on substrates

Trymax Semiconductor Equipment BV, a plasma company based in the Nerthelands, has received multi-system orders for its NEO 2000 Series from a Chinese compound semiconductor foundry. Shipping of the first systems will be in Q4 2018 and continue during Q1 2019.

Trymax's NEO 2000 Series was selected by the customer to perform photoresist ashing and descum on SiC and LiTaO3 substrates. Main end applications will be in the field of RF and power electronics that are both facing significant growth driven by the IoT, 5G, and automotive.

The NEO 2000 Series is described as a high throughput and low cost of ownership dual chamber system. It will be configured with both high and low temperature plasma chambers and process wafers from 4 up to 8inches. These multi-system orders come in addition of previous multi-system orders received by Trymax from the same customer a few years ago.

"We are thankful by this strong vote of confidence in our state-of-the-art solutions" stated Ludo Vandenberk, executive VP of Trymax. "Partnership and best-in-class customer support has been key values of Trymax since the beginning of the company's operations. Winning this additional business confirms our strategy is right and we look forward to supporting our customer growing its business".

Trymax will be exhibiting at SEMICON Europa in Munich (Germany) from November 13 to 16th 2018.

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