News Article
KJLC Offers New HiPIMS Power Supply
Can be integrated to any existing sputtering system for process development and R&D applications
The IMPULSE unit has a 2kW output and is offered in both a Single and Dual configuration. The Dual configuration provides the ability to power two (2) independent sources up to 2kW each which is ideal for co-deposition. High repetition rates, up to 2 kHz, enable higher deposition rates with shorter pulses. Another option is to run 4kW into a single source, since both units can be set for either "master" or "slave" mode. The Dual option also has a DC bias option for the substrate. If a researcher is using the Dual supply with a single source, he can use the additional supply for a DC bias on the substrate.
The IMPULSE has both front panel and remote control options with up to five user-selectable presets.
