Picosun introduces production-scale AlN batch process
Picosun Oy, a Finnish supplier of ALD (Atomic Layer Deposition) technology, is now providing a production-scale AlN batch process which it says is fast and has superior film thickness uniformity.
According to the company, compatibility with III-V -semiconductors makes AlN an excellent material for power electronics. In mobile communications, the material is used in the production of RF filters and microphones.
"We have achieved excellent results in our new AlN batch process, so we are very happy now to offer it to our industry customers for mass manufacturing applications. AlN is a very sought-after material amongst our microelectronics production customers", says Erik Østreng, applications and services director of Picosun.
"We at Picosun want to offer our customers comprehensive, turn-key ALD manufacturing solutions and the best and most agile customer care. A process, tailored, optimised and ramped-up for each customer's individual needs is the core part of this solution", continues MJuhana Kostamo, managing director of Picosun.
