Rob Rhoades Joins Revasum as CTO
Revasum has announced that Rob Rhoades has been appointed chief technology officer (CTO), effective October 5, 2017.
In his role, Rob will be responsible for overseeing all process development and applications support for Revasum's CMP and grinding products, reporting directly to Jerry Cutini, chief executive officer. "Rob is a tremendously talented and seasoned leader with a proven track record of developing integrated process solutions.His extensive industry experience and strong background in semiconductor technology make him uniquely qualified to take Revasum's technology to the next level," said Jerry Cutini. "We are honored to welcome Rob to the executive team and are confident that he will provide the leadership and vision necessary to help drive excellence throughout the company."
Rob brings over 23 years of experience in developing leading CMP process technology. His expertise includes process engineering, CMP integration, and global applications support for everything from R&D prototypes through volume production on virtually any material. Rob began his career in semiconductors at Motorola in plasma CVD and quickly transitioned to take over responsibility for ramping CMP into production for oxide, tungsten, and STI CMP. Recently, Rob held a number of executive positions including Director of Engineering at Rohm & Haas and CTO at Entrepix, Inc. "The entire semiconductor industry continues evolving at a rapid pace, particularly with regard to CMP, surface finishing, and minimizing form factors. Revasum is ideally positioned in the center of this technology evolution with core strengths across CMP and grinding equipment." said Rob Rhoades
"I am excited and energized to join this great company at the beginning of this next exciting chapter for the industry." Rob has been awarded 12 patents in the areas of process methods, novel materials, and CMP applications. Over his career Rob has published 105 publications and presentations on CMP, including "The Dark Art of CMP". Rob holds a PhD in Electrical Engineering from the University of Illinois, College of Engineering. He is currently on the executive committee for ICPT, the planning team for AVS CMP Users Group, and serves as a lead organizer for the ECS symposium on CMP.
