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Taiyo Nippon Sanso MOCVD Division Wins Industry Award


Annual Japan Society of Vacuum and Surface Science award recognises significant contributions to the advancement of surface and vacuum science-related industries

Taiyo Nippon Sanso has announced that its MOCVD equipment division (TNSC) for GaN and AlN devices has received the 2020 Industry Award from The Japan Society of Vacuum and Surface Science.
This award is presented annually to recognise significant contributions to the advancement and development of the surface and vacuum science-related industries.
TNSC has been developing MOCVD equipment since 1983, and has delivered more than 500 MOCVD equipment sets to manufacturers and research institutions in Japan and abroad.
In 2015, TNSC developed the SR4000HT reactor model for high Al content AlGaN UV LEDs. The SR4000HT allows for AlGaN film deposition at a high temperature (greater than 1300degC.
In 2012 TNSC introduced the UR26K reactor model, a large-scale mass production platform that can process 8-inch substrates, including high performance mass production of GaN HEMTs on Si. The UR series reactors optimise film properties and productivity by reducing the operating time and supporting cleaning technology for reactor components.

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