Tegal moves into atomic layer deposition
Simplus offers a multi-chamber tool incorporating its patented NLD and plasma enhanced NLD processes that are similar to atomic layer deposition (ALD), but with much higher throughput.
The acquisition adds to Tegal’s process technology portfolio, which includes etching tools for silicon and compound semiconductors, and also sputter deposition. Atomic layer deposition is one of the techniques now being investigated by the silicon industry for a variety of applications including the deposition of high-k dielectrics which are needed to replace silicon dioxide and oxynitride.
Tegal has also reported its financial results for its second fiscal 2004 quarter ending 30 September. Revenues were $3.2 million, 20% higher than the year ago period and down 17% on the June quarter.
The Company reported a net loss of $1.7 million, compared to a net loss of $4.8 million in the same period last year, and $1.3 million in the previous quarter. Tegal s loss included non-cash interest expense of approximately $0.3 million related to its recent convertible debt financing. Excluding the non-cash interest expense, Tegal s net loss would have been $1.4 million the same as the June quarter.
