Hopkins honored with 2009 Bacus Lifetime Achievement Award
Hopkins helped found RAVE, with the idea of using the Atomic Force Microscope (AFM) in a revolutionary new nanomachining approach for repairing extremely small defects on advanced critical level photomasks.
In 2010 Hopkins will celebrate 47 years in the semiconductor industry with 40 of those years dedicated directly to the photomask industry.
“Those 40 years have been committed to every aspect of the mask making sciences, captive and commercial mask business development and eventually mask equipment technology,” the award citation states. “Just when it was needed, Barry’s vision and perseverance in the mask repair equipment arena provided a yield improvement pathway and tremendous cost saving advantage to advanced mask makers around the world.”
Hopkins is an SPIE Member and has participated in numerous SPIE conferences.
For more information about SPIE Photomask Technology, see spie.org/photomask.xml.
BACUS is SPIE’s international technical group for photomask technology.
