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LNI Orders Research MBE Reactor from Riber

The tool will be used to explore the dimensions of silicon as a substrate material in the photonic, telecommunications, defense and environment industries.

Riber, a global provider of molecular beam epitaxy (MBE) equipment, has received an order for its Compact 21 research system from the Lyon Institute of Nanotechnology (INL). INL has experience of Riber tools and the Compact 21 system will further contribute towards expanding the Institute's research capabilities into the use of the "universal" substrate silicon. The INL is a mixed research unit, overseen by the French national center for scientific research (CNRS), Ecole Centrale de Lyon, INSA de Lyon and Université Lyon . Applications include the semiconductor, photonic, telecommunications, defense and environment   industries. The Compact 21 system sold to the INL is said to offer a very high level of modularity and flexibility. Its original design makes it possible to deposit materials with low and high evaporation temperatures simultaneously, which is particularly well-suited for growing crystalline oxides on silicon. Drawing on Riber's technical experience and INL's oxide growth expertise, this machine is being integrated into the other Riber systems in place at the INL, devoted to growing III-V semiconductor- based nanostructures. The project is being financed with funds from the State-Region planning contract. Riber designs and produces molecular beam epitaxy (MBE) systems and evaporation sources and cells for the semiconductor industry. This high-technology equipment is essential for the manufacturing of compound semiconductor materials and new materials that are used in numerous consumer applications, such as new information technologies, OLED flat screens and new generation solar cells.

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