News Article
Oxford Instruments to host one day workshop in Grenoble
The workshop at Minatec, Grenoble, France on 18th October 2011 will include lectures on recent progress in gallium nitride power rectifiers, indium phosphide and gallium arsenide etching and III-V etching for nanowire applications
Oxford Instruments is hosting a one day nanoscale plasma processing seminar which will focus on latest innovations in III-V Etch, MEMS, Ion Beam, Atomic Layer Deposition, Silicon and more.
The workshop is open to all those people working in industry and academia, with an interest in recent progress in research and development, plus future trends in the fabrication and application of micro & nano structures and devices.
Taking place on 18th October 2011 between 8.30am and 3.30pm at Minatec, Grenoble, France, the seminar will consist of presentations, discussions, and a networking lunch.
The talks will include topics such as:
III-V Etching for nanowire applications
Recent progress in GaN power rectifiers
InP and GaAs etching developments
Developments in Ion Beam etch and deposition
Si etch using PlasmaPro NGP80
ALD overview: Technology & results
Plasma sources & developing plasma etch processes
MEMS etch developments
The following speakers have agreed to participate:
Meeting Chair: Thibaut David from LETI
Daniel Alquier, Directeur, LMP, Tours
Alex Robinson, Birmingham University, UK
Francois Neuilly, IEMN, Lille, France
Speakers from Oxford Instruments Plasma Technology will include:
Ligang Deng, III-V etch
Mike Cooke, Chief Technology Officer
Sebastien Pochon, Ion Beam
Dave Pearson, Ion Beam
Chris Hodson, ALD
Knut Beekmann, PV and Deep Si Etch
Talks will be in English or French at the speakers' choice. There is no charge for this workshop, although Oxford Instruments says that advance booking is essential.
Oxford Instruments is also taking part in the MNE2011 event in Berlin, Germany between 19 and 23rd September 2011 and Semicon Europa in Dresden, Germany between 11 and 13th October 2011.
