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SemiTEq announces next generation of PVD and PECVD Systems

SemiTEq targets intensive R&D and small-scale production for up to 8” wafers
Russian MBE manufacturer SemiTEq has announced its next generation of PVD and PECVD Systems on the technological platform STE ICP for ICP plasma etching (STE ICP200E) and PECVD (STE ICP200D).

Both systems are designed for intensive R&D as well as small-scale production for up to 8” wafers.

The platform has an aluminium process chamber and a new design of load lock chamber, configured for installation through the clean room wall. The new table design provides advanced helium cooling for long etching processes and precision heating with thermal stabilisation for PECVD, controlled by software that allows for flexible programming of the process.

SemiTEq JSC core competences are in the development and production of MBE Systems for a wide range of III-V, wide band gap II-VI and III-nitride compound semiconductor growth. Key system components have a patented design.

MBE Systems and Wafer Processing Equipment product lines ensure the quality of epiwafer growth and its further processing under R&D as well as pilot production.

SemiTEq is the sole Russian MBE manufacturer.

SemiTEq ICP 200D
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