AMSL announces extreme UV test at second customer
Dutch lithography firm ASML has announced that a second customer has successfully performed an EUV (extreme ultraviolet) endurance test during which wafer processing capability was proven of around 600 wafers within 24 hours on its NXE:3300B EUV lithography system.
The endurance test was designed to simulate a production run and, similar to an earlier test in July at another customer, exceeded the 500 wafers per day requirement that ASML customers have set for the end of the year.
ASML president and CEO Peter Wennink told a webcast investor conference in New York that ASML is encouraged by the result of this second test. However, EUV-performance needs to be repeated on multiple days and multiple systems, which is the goal of the availability improvement programs that will be executed throughout the remainder of the year.
