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Oxford Instruments to present on Patterned Sapphire Substrate etching

Dual language webinar on ways to increase productivity and yield

Oxford Instruments has announced that it will be presenting a dual language web-based seminar entitled "˜Patterned Sapphire Substrate (PSS) Etching Using Innovative Plasma Processing Technology'  on the 4th June 2015.

Presentations will be given in English (Mark Dineen, optoelectronics product manager, Oxford Instruments) and Mandarin Chinese (Young Huang, field and lab applications manager, Oxford Instruments) with opportunities to ask questions in both English and Chinese.

LED manufacture requires critical plasma etch steps (patterned sapphire substrates (PSS), and GaN etch) and deposition steps for passivation, current blocking and mask creation. These are performed by an increasing variety of techniques for example Plasma Enhanced Chemical Deposition (PECVD). 

Mark Dineen commented: "This webinar presentation describes the approaches taken to increase productivity in these processes, both by increasing the process rates and using technology to improve the yield on each wafer."

The webinar will be at 3PM CST on the 4th June 2015.


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