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SemiTEq upgrades e-beam evaporation system

More ergonomic STE EB71 design provides better access for installation and maintenance

SemiTEq JSC, a Russian equipment manufacturer, has announced an improved version of its STE EB71 e-beam evaporation system for high-quality thin-film compositions in UHV (ultra high vacuum).

The basic version was released in 2008 and was intended for wafers up to 150 mm in diameter and was desiged for lift-off technology (3x3in or 6x2in).

For the new upgrade, which will be released this month, the company has focused on improving the ergonomics and ease of maintenance of the STE EB71 for the end user. Amongst the improvements are an increase in the maximum distance from the target to the substrate (up to 500mm) to reduce the impact on the electron resist. Also the working height has been reduced to both improve the ergonomics and provide better access for easy installation and maintenance of the ion source.

SemiTEq is also announcing this year's release of the upgraded installation e-beam evaporation STE EB65, which will be intended for wafers up to 20x3in, 12x4in in the same process with the implementation of technology lift-off.

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