Corial unveils platform for 6inch Patterned Sapphire Substrates
Corial, a manufacturer of plasma etch and deposition equipment, has announced the general availability of a process for sapphire patterning (PSS) on 6inch wafers, to be used in high-volume LED production with the fully automated Corial PS200 single-module platform.
Patterned Sapphire Substrate is the standard in the LED industry to get brighter LEDs. Going back to 2009, Corial has been among the first companies to supply a stand-alone ICP system with etching processes dedicated to PSS application.
Based on a production-proven plasma technology, the new Corial PS200 is a fully automated single module platform combining the highest productivity on sapphire substrates with excellent etching performances for PSS application.
According to Corial, key advantages of the PS200 platform include; a high density plasma source providing best in class uniformity and process repeatability; dingle wafer processing with Brooks elevator for front end cassette in vacuum load-lock and Brooks robot in vacuum transfer chamber for fully automated wafer handling; and production flexibility with extendable platform configuration (up to three process modules).
Corial patterning process on 6inch wafers has been tested and qualified by a major LED manufacturer in Asia. Typical results for PSS on 6inch wafers are: average STD within wafer < 0.5; PSS height of 1800nm ± 40 nm and PSS width of 2800nm ± 40nm; ≤ ± 1.5 percent etching uniformity (conical shape); and a throughput ≥ 2.5 wafers/hours
Corial says that its application engineers will develop the recipes that best match with the required specifications providing the best edge of wafer results and maximising the process uniformity and repeatability.
