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Corial Releases time-multiplexed Process Control Software

Enables atomic layer processing using conventional dry process tools

Corial, a French provider of plasma etching and deposition equipment for R&D, compound semiconductor, MEMS and LED industries, has announced new software enabling pulsed or time-multiplexed processing on conventional dry process tools.

Called Cosma Pulse, the software adds new capabilities (pulse of process parameters) to conventional dry etching and PECVD systems to realise DRIE-Bosch processing, Atomic layer etching (ALE) and/or Atomic layer deposition (ALD).

Developed with the R&D market in mind, Cosma Pulse can control and pulse simultaneously and independently from each other all process parameters, including gas flow rate, working pressure, RF power, LF power, or virtual process parameters, according to the company.

"We are proud to announce the first successful demonstration of Cosma Pulse on a 200 mm ICP-RIE system", said Jean-Pierre Roch, r&d manager at Corial. For this demo, Corial has chosen the DRIE-Bosch - a classical process, which alternates repeatedly etching and passivation steps to achieve deep anisotropic etching of silicon structures. DRIE-Bosch is the cornerstone of MEMS, advanced packaging and power devices manufacturing flows.  According to Jean-Pierre Roch: "Cosma Pulse, with adequate electronic controller, will deliver very fast process step switching from 10 ms for a single process step up to 1 minute".

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