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Nanjing University orders Oxford Instruments plasma systems

PlasmaPro 100s to be used in nanotechnology research for silicon and III-V etching

Manufacturer of plasma etch and deposition processing systems Oxford Instruments Plasma Technology has recently won an order from Nanjing University of Post and Telecommunications.

Based in Nanjiang, Jiangsu, China, the university has ordered multiple plasma etch systems to be used for silicon and III-V etching. The PlasmaPro 100 systems offer a range of processes, making them suitable for the nanotechnology research being undertaken by Nanjing University.

PlasmaPro 100 process modules are built on 200mm platforms, with single wafer and multi-wafer batch capability. The process modules are said to offer  uniformity and high throughput processes on a range of applications.

"As a leading research centre in China we conducted a rigorous tender process and decided on Oxford Instruments for their state-of-the-art processing equipment that is key to our successful research", said Huang Xiaoming of the Nanjing University of Post and Telecommunications.

 "The process modules offer excellent uniformity and high throughput processes, which together with a global customer support network, and low cost of ownership made this the system of choice for our University."

"Receiving a multiple system order from this respected Chinese university is great news for us", comments Frazer Anderson, strategic marketing and business development director at Oxford Instruments Plasma Technology.

"We are committed to providing our research customers with technologically innovative solutions through leading edge flexible process equipment. Our PlasmaPro etch tools, installed in the Nanjing University cleanroom will enable a wide range of research programs utilising their capabilities in III-V and silicon etching".

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