The firm's concentrator triple-junction compound solar cell enables the efficient conversion of sunlight into electricity with a stack of three photo-absorption layers, the bottom most of which is made from indium gallium arsenide
EV Group (EVG), a supplier of wafer bonding and lithography equipment, and Dynaloy, LLC, an international manufacturer of chemicals for the electronics industry and wholly owned subsidiary of Eastman Chemical Company, today introduced CoatsClean™-an innovative single-wafer photoresist and residue removal technology designed to address thick films and difficult-to-remove material layers for the 3D-ICs/through-silicon vias (TSVs), advanced packaging, microelectromechanical systems (MEMS) and compound semiconductor markets. EVG state CoatsClean provides a complete wafer cleaning solution that offers efficiency, performance and cost-of-ownership (CoO) advantages compared to traditional resist stripping and post-etch residue removal methods.
Khaled Juffali company has announced a 1 MW project with the world’s largest oil producer. It aims to test CPV technology for future utility-scale installatins and lay solid groundwork for new solar projects in Saudi Arabia
Researchers in the US have advanced molybdenum disulphide (MoS2) technology. This semiconductor could be joined with graphene and hexagonal boron nitride to form FETs, integrated logic circuits, photodetectors and flexible optoelectronics