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Oxford Instruments announces MoS2 growth process

CVD process offers growth on a range of substrates and for other 2D materials

Process solutions firm Oxford Instruments has announced the development and launch of the MoS2 growth process using its Nanofab nanoscale growth system.

Single layer MoS2 is a direct band gap semiconductor which has wide ranging applications in optoelectronics such as LEDs, photovoltaics, photodetectors, and bio sensors. Multi layer MoS2 is an indirect band gap semiconductor which shows promise in future digital electronics.

Oxford Instruments says that its scientists have undertaken extensive research and optimisation of this CVD process, developed on a Nanofab system equipped with  precursor delivery modules capable of delivering a wide range of liquid/solid/metal organic precursors suitable for 2D materials growth.

Offering growth on a range of substrates including sapphire and ALD alumina (Al2O3 and SiO2), the system is capable of depositing other 2D transition metal dichalcogenides (TMDCs) such as WS2, MoSe2 etc.

"This process development and its proven results are extremely exciting, as we enter a new phase in our 2D materials processing capabilities with the Nanofab plasma processing system", comments Frazer Anderson, strategic marketing and business development director at Oxford Instruments Plasma Technology,

He added: "Raman analysis has demonstrated a high quality mono-layer, with AFM showing resultant smooth and uniform films. We anticipate that this development in 2D materials growth will facilitate the next generation of nano electronic devices."

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