Samco launches PECVD and ALD demo facility
Kyoto-based facility will include ten PECVD and ALD systems to support growth of deposition and coating business
Samco, a manufacturer of plasma processing equipment for the compound semiconductor industry, has announced the opening of its new PECVD and Atomic Layer Deposition (ALD) demonstration facility at Samco’s headquarters, Kyoto, Japan.
Samco’s PECVD and ALD systems are used for manufacturing optoelectronic and electronic devices. The rapid growth of the 5G and IoT markets has fuelled demand for PECVD and ALD process equipment.
“This new facility is of strategic importance to Samco as it will enable further revenue growth in the compound semiconductor market. There will be ten PECVD and ALD systems for demonstration in the class 1000 cleanroom space of 217.61 m2,” says Tsukasa Kawabe, Samco’s president and COO.
“The facility will greatly strengthen our ability to develop future process applications and technologies with our customers across the globe. The volume of demonstration tests requested by customers that can be handled is expected to be more than double the current level. Moreover, our customers and partners could collaborate with us in prototyping and pilot-line production utilising the new facility,” he adds. “In particular, we are planning on conducting joint research and development projects with universities, research institutes, companies, and other external parties more aggressively than ever.”
“Samco’s three pillars of core technology are deposition, etching, and surface cleaning. We will leverage this new facility to further expand sales of the PECVD and ALD systems,” says Kawabe.
