Epigress licenses HTCVD technology from Okmetic
Okmetic developed its proprietary HTCVD technology in conjunction with Linköping University, Sweden. Most bulk SiC material is grown by sublimation, while in HTCVD the material is grown directly from gas-phase precursors (silane and ethene) at temperatures above 2000 degrees C.
Okmetic and Epigress aim to jointly exploit the HTCVD technology through the agreement. Okmetic is currently finalizing plans to expand its manufacturing capacity of SiC material into a full industrial scale. Epigress plans to deliver HTCVD equipment to develop an industrial base of SiC material manufacturing. Both companies will work in close collaboration to secure the long-term growth of SiC wafer market to the benefit of both companies.
SiC has a very significant market potential when used for manufacturing SiC-based components for advanced high-frequency, high-power and high-temperature applications. Examples include fast switching, power management, high-voltage power transmission and microwave power applications. Okmetic AB and Epigress AB have been working jointly to develop industrial equipment and processes based on the HTCVD technology during recent years.
Epigress, a member of the Aixtron group based in Lund, Sweden, is the leading supplier of SiC CVD equipment with numerous university and industrial customers worldwide. These include Linköping University, IKZ Berlin, FHG IIS Erlangen, CEA LETI Grenoble, ACREO Kista, Purdue University, Northrop Grumman, Okmetic, Sterling Semiconductors and SiCED, as well as numerous Japanese universities and corporations. The company provides an extensive worldwide service and support network for maintenance as well as upgrading of its systems through Aixtron s Global Service Organization.
Okmetic manufactures high-quality silicon wafers and other products based on silicon for the worldwide semiconductor and sensor industries. The company also sells SiC wafers and epitaxy, and has plants in Espoo and Vantaa in Finland and in Allen, Texas.
