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Communicant and IHP break SiGe:C device records

The progress of SiGe bipolar technology took another step forward when Communicant and IHP revealed that they had developed a SiGe:C BiCMOS process that is yielding record-breaking devices
Communicant Semiconductor Technologies and Innovations for High Performance Microelectronics (IHP) both of Frankfurt, Germany, have partnered to develop a SiGe:C BiCMOS process that is yielding devices with record breaking performance.

ICs with a ring oscillator gate delay of 4.2 ps have been demonstrated. This is the fastest yet reported for a BiCMOS technology. The high performance HBT module give ft and fmax values of 200 and 170 GHz respectively, with a BVCE0 of 2.0 V.

The process uses a low number of additional lithography levels, eliminating complex processes such as subcollector epitaxy and deep trenches. The benchmark circuits fabricated include 53-stage CML ring oscillators, static and dynamic dividers, and LC oscillators, with the last substantially exceeding previously reported highest speeds for silicon-based ICs.

“We are very excited about the new benchmarks with our SiGe:C BiCMOS technology,” said Communicant CEO, Abbas Ourmazd. “Communicant and the IHP are working toward establishing Germany as a global technology center for communication-enabled integrated circuits. Such IC’s are at the core of nearly all next-generation electronic products.”

Further details of the process and device performance will be revealed in a presentation at the International Electron Devices Meeting (IEDM) in San Francisco in December.

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