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New technical sessions introduced at CS-MAX

CS-MAX – the Compound Semiconductor Manufacturing Expo – will be held November 11-13, 2002 at the McEnery Convention Center in San Jose, California.

The discount pre-registration deadline is October 25. To register, visit www.cs-max.com.

The two-and-on-half day Technical Program will include 100 papers presented in 27 sessions, dealing with all aspects of manufacturing compound semiconductor devices, including LEDs, laser diodes, and III-V ICs.

The conference scope has been expanded this year to include sessions on heterointegration and silicon heterostructures. Presentations in these areas will include:

* BiCMOS integration of SiGe:C HBTs – Dieter Knoll, Communicant Semiconductor Technologies
* SOI market and technology – Carlos Mazur, Soitec
* The commercialization of strained silicon technology – Mayank Bulsara, AmberWave Systems
* Plasma process sequence for manufacturing SiGe virtual substrates – Hans Martin Bushbeck, Unaxis Semiconductors
* A wafer-scale approach for low cost optical component integration – William Waters, Optogration
* Compound semiconductors on silicon – Fabrice Letertre, Soitec
* 8-inch Ge substrates for micro and opto applications – Bendix De Meulemeester, Umicore
* Wafer-bonded InGaAs-on-Si devices – Steve Hummel, Nova Crystals

Other new topics for 2002 include Environmental Health and Safety and Gas Analytics.

CS-MAX 2002 will also include the industry’s largest exhibition of compound semiconductor-related equipment, materials and services, with 100 companies participating. The exhibit is open on November 12 and 13, and exhibit-only registrations are available.

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