Loading...
News Article

InSb speeds up p-channel MOSFETs

Intel and QinetiQ unveil an InSb quantum well FET with a record-breaking cut-off frequency, overcoming a major hurdle on the way to all-compound semiconductor CMOS.

III-V MOSFET developers have devoted many years to the search for a suitable p-channel material for their transistors, which promise high-speed, low-power logic devices.

But their pursuit may now be over with Intel and QinetiQ saying that they have found a strong candidate in InSb.

The US silicon chip maker and UK defense company presented a paper at the IEEE Electron Devices Meeting in San Francisco, California, on December 17 where they detailed the structure of a III-V quantum well FET with a record p-channel cut-off frequency (fT).

This 40 nm gate length transistor, which features a compressively strained 5 nm thick InSb quantum well, delivers an fT of 140 GHz at a supply voltage of 0.5 V.

The work compliments earlier research by the partnership, which developed n-channel transitors on silicon and InSb substrates with cut-off frequencies up to 300 GHz. Both types of devices are needed for CMOS.

The p-channel FET s high cut-off frequency stems from a high hole mobility in InSb, which has been maximized through strain optimization. At 1.9 percent compressive strain, hole mobility hits 1230 cm2V-1s-1.

Strain is created in InSb by sandwiching it between two Al0.35In0.65Sb barriers.

All of the transistor s layers were grown by MBE on (100) GaAs, and a wet etch produced the gate recess, which created a 10 nm gate-to-channel separation. Ti/Al metallization formed the gate, source and drain contacts.

The researchers claim that their transistor also delivers a record transconductance for III-V p-channel FETs of 510 µS/µm.

In addition, they say that their device's performance is superior to that of silicon equivalents. “Compared to silicon p-MOSFETs, the InSb p-channel QWFETs show a reduction in gate delay and a significant improvement in energy-delay product, which represents the energy-efficiency of the device," write Marko Radosavljevic and co-workers.

At identical speeds, the InSb MOSFET uses one-tenth of the power of a silicon equivalent, and delivers a two-fold speed advantage at the same power.

×
Search the news archive

To close this popup you can press escape or click the close icon.
Logo
x
Logo
×
Register - Step 1

You may choose to subscribe to the Compound Semiconductor Magazine, the Compound Semiconductor Newsletter, or both. You may also request additional information if required, before submitting your application.


Please subscribe me to:

 

You chose the industry type of "Other"

Please enter the industry that you work in:
Please enter the industry that you work in: