SPIE Lithography Asia will draw top lithographers to Taiwan
Dates are 18 and 19 November at the Sheraton Taipei Hotel.
Taiwan is a natural location for the conference. A major portion of the
world s microelectronics and FPD products are manufactured in Asia and
an increasing segment of R&D for lithography processes and equipment
technology have moved to Asia as well, as semiconductor and FPD
industries have expanded globally over the past several decades.
Among featured presentations by leading researchers, developers, and
innovators are four plenary talks:
* Kinam Kim of Samsung Electronics, on the future of the silicon
industry
* Cheng-Wen Wu of Industrial Technology Research Institute, on
the designer s perspective on 3D integration
* Burn J. Lin of Taiwan Semiconductor Manufacturing Co., on the
contrast and challenges between photon and electron beam patterning
technologies
* Christopher J. Progler of Photronics, Inc., on mask technology
and timing for IC and LCD applications.
Lin is one of four conference chairs, along with Alek Chen of ASML
Taiwan, Woo-Sung Han of Samsung Electronics, and Anthony Yen of Taiwan
Semiconductor Manufacturing Co.
More than 100 technical papers will be presented, and an evening welcome
reception will include a poster session.
Best student paper awards sponsored by ASML and Cymer will be awarded.
Other meeting sponsors are Sokudo, Mentor Graphics, Entegris, and Tokyo
Electron. The Taiwan Semiconductor Industry Association is a cooperating
organization.
See the SPIE Lithography Asia
event website for more information.
