News Article
Oxford Instruments Plasma Technology will hold another seminar.
Oxford Instruments Plasma Technology will hold another in its series of succesful seminars in Glasgow on 30th June 2010. The seminar's wide programmes will include talks by Oxford Instruments Plasma Technology (OIPT) applications & development scientists, in addition to key guest speakers, and Speakers from the University of Glasgow.
Nanoscale Plasma Processing Workshop
Wednesday 30th June 2010
Presented by: Glasgow James Watt Nanofabrication Centre & Oxford Instruments Plasma Technology
Venue: University of Glasgow
Timing: 9.30am – 4.30pm
Presentations, Discussions, Laboratory Tour and a networking lunch
This one day seminar will focus on latest innovations in Atomic Layer Deposition, Silicon and III-V Etch.
Registration and coffee - 9:00 – 9:30
Welcome Introduction to the Glasgow James Watt Nanofabrication Centre - 9:30-10:00
Prof Douglas Paul, Dept of Electrical & Electronics Engineering, University of Glasgow
III-V Etching – Nanoscale and low damage -10:00 -10:30
Dr Ligang Deng, OIPT
Introduction to Kelvin Nanotechnology - 10:30-11:00
Brendan Casey
Break - 11:00-11:20
High resolution patterning and etching - 11:20-11:50
Dr Alex Robinson, University of Birmingham
Introduction to ALD – materials and applications - 11:50-12:20
Chris Hodson, OIPT
Lunch break - 12:20-13:15
Challenges for Atomic Layer Deposition for CMOS devices with high mobility channel materials - 13:15-13:45
Annelies Delabie, IMEC
Silicon Etch – Alternative processes - 13:45-14:15
Bob Gunn/Colin Welch, OIPT
Closing remarks and questions - 14:15-14:30
Prof Douglas Paul
Cleanroom tours - 14:30-15:30
Prof Douglas Paul & Dr Haiping Zhou, Dept of Electrical & Electronics Engineering, University of Glasgow
Networking Tea - 15:30-16:00
Forfurther information&to book a place on this Workshop please contact:
ClaireKiermasz, Oxford Instruments Plasma Technology
Email:plasma@oxinst.com Tel:01934 837000
