WEP Installs ECV Profiler at Aixtron R&D Lab
WEP is installing its Wafer ECV-Profiler CVP21 at the Application Laboratory of Aixtron in Aachen in the second quarter of 2010.
The CVP21 is a fully automated tool for carrier concentration profiling, and uses Electrochemical Capacitance Voltage (ECV) measurements.
During my past experience in a III-V fab, the ECV tolerances were plus or minus 30%; this applied to both n-type and p-type dopants and included zinc doped indium phosphide (InP) and carbon (C) and silicon (Si) doped gallium arsenide (GaAs). The repeatability and reproducibility were highly dependent on operator and the specific equipment used when performing the measurement including the cell and the main unit.
This new system uses a fully automated measurement process and incorporates fluid handling, electrochemical cell movement, in-situ imaging and automated CV scan analysis to produce reproducible measurement results with high accuracy. It contains a patented process for the processing of (Al,In)GaN samples in full-automation mode and should eliminate some of the variables which affect measurement variability .
Such components are used in display technology, signal and lighting technology, fiber communication networks, wireless and cell telephony applications, optical and electronic data storage, computer technology as well as a wide range of other high-tech applications.
The CVP21 will be installed at the R&D application lab of Aixtron where several deposition systems are operated for test and development.
“WEP welcomes the positive feedback of a market leader such as Aixtron AG”, said Thomas Wolff, President of WEP. “The CVP21 is an advanced equipment to monitor the quality of semiconductor layers and includes comprehensive self-calibration algorithms to achieve results with high reliability.”
He concluded, “Aixtron is recognized for its profound expertise in the field of MOCVD process technology and WEP is proud to support this well known high tech company in the development of next generation deposition equipment. Currently there is very strong demand for CVP21 equipments world-wide.”
