News Article
Nanotronics “Point and Shoot” technology ideal for CS defect characterisation
The flexible system images defects on 2” to 8” wafers and aims to eliminate a learning curve for users, whilst providing accurate and easy to interpret data.
Nanotronics Imaging is introducing its nSPEC semiconductor analysis system at the CS Mantech show in Palm Springs, California. CS Mantech takes place at the Hyatt Grand Champions Resort & Spa between Monday May 16th and Thursday May 19th, 2011.
The proprietary software and hardware underlying nSPEC enable rapid and detailed analysis of wafer defects and are particularly suited to compound semiconductor wafers.
Complete system automation with cassette-to-cassette loading of 2”-8” wafers is also available. Nanotronics uses “Point and Shoot” microscopy, and aims to eliminate a learning curve for users, while giving accurate and easy to interpret data.
Nanotronics Imaging has also appointed a new Vice President Ivan Eliashevich, who brings a level of expertise in the semiconductor industry that is unique. “I knew Ivan as a client, who helped me to understand wafer technology. He is honest, knowledgeable, and a powerful proponent for the customer and supplier. I feel lucky to have him as a part of our team”, says CEO and founder Matthew Putman.
