News Article
Oxford to host “Nanoscale Plasma Processing” workshop
The one day workshop, taking place in Grenoble, France on Tuesday 18th October, will offer a broad insight into research solutions and results and will include discussions on III-V etch for nanowire applications.
The workshop will be particularly relevant to all those people working in industry and academia, with an interest in research and development advances, plus future trends in the fabrication and application of micro & nano structures and devices.
Organised by Oxford Instruments Plasma Technology, the event will take place at the prestigious French research centre CEA-LETI in Grenoble, France. The workshop will comprise of presentations, discussions, and a networking lunch, focussing on latest innovations in MEMS Etch developments, Ion Beam Etch and Deposition, Atomic Layer Deposition, Silicon and III-V Etch for nanowire applications and more.
Guest speakers from key research institutes will discuss their research and include:
Daniel Alquier, Directeur, LMP, Tours
A speaker from IEMN, Lille, France
Alex Robinson, University of Birmingham, UK
In addition, experts in their field from Oxford Instruments will speak on the latest process and application developments in a number of plasma processing areas.
“We’ve been hosting these successful seminars worldwide for several years, most recently at IOS-CAS in China, Lawrence Berkeley National Laboratory USA and the University of Southampton, UK, attracting many scientists to each event”, comments Mike Smyth, EMEA Business Manager, Oxford Instruments Plasma Technology, “We’ve chosen Grenoble as our next venue as it is a hub for innovation in France. These workshops are a terrific opportunity for academic and industrial technologists to network and share ideas”
There is no charge for this workshop, however Oxford Instruments says advance booking is essential.
