News Article
Bruker‘s HB-LED AFM has an edge
Specifically designed for patterned sapphire substrate inspection, the firm’s latest Atomic Force Microscope (AFM) for advanced production metrology is designed for 2 to 6 inch wafers.
Bruker has recently launched the “Dimension Edge PSS” AFM.
This is a production-environment tool specifically tailored for patterned sapphire substrate (PSS) metrology in high brightness light-emitting diode (HB-LED) manufacturing.
Dimension Edge PSS with AutoMET software and 9 wafer chuck
Bruker says the Dimension Edge PSS is easy-to-operate and delivers resolution far beyond traditional optical techniques while at the same time providing precise 3D profile information to control the most advanced PSS processes.
The system performs automated measurement, data collection, data analysis and report generation on 2- to 6-inch wafers for production metrology applications, and offers a multitude of AFM capabilities essential for LED R&D.
The Dimension Edge PSS comes with Bruker’s exclusive AutoMET software package, which the company says greatly improves manufacturing productivity by fully automating AFM data collection and analysis report generation. It also provides a PASS/FAIL output for technician operation, which is key in a production environment.
“Driven by ever increasing performance and cost demands, HB-LED manufacturers are looking to PSS technology to deliver critical process improvements, and the Dimension Edge PSS is instrumental in controlling these advanced processes,” said Mark R. Munch, President of the Bruker Nano Surfaces Division. “The Dimension Edge PSS provides rapid process feedback with its speed of measurement and unmatched precision and resolution.”
“With the release of the Dimension Edge PSS, Bruker continues to demonstrate its commitment to superior AFM performance and usability for both researchers and production environments,” added David V. Rossi, Vice President and General Manager of Bruker’s AFM Business. “The Dimension Edge PSS brings reliable AFM metrology into industrial applications, enabling the highest resolution measurements, and providing simple pass or fail measurement criteria for operator ease of use.”
