News Article
Plasma Etch rolls out the PE-100 Convertible
The new tool provides the user with the ability to switch back and forth between RIE anisotropic type etching mode applications and isotropic type etching/cleaning mode applications used in compound semiconductor manufacturing.
Plasma Etch has introduced a revolutionary new plasma system that incorporates two individual plasma etching / cleaning type/mode technologies into one complete standalone plasma etching/cleaning system.
The PE-100 Convertible allows the user the ability to switch back and forth between RIE anisotropic type etching mode applications and isotropic type etching/cleaning mode applications. Traditionally, two separate standalone plasma systems were necessary to achieve this capability.
The PE-100 Convertible is claimed to be a perfect system for R & D, medical devices, solar cells, optics, printed circuit boards, MEMs, wafer level packaging, and laboratories applications as well as many other related semiconductor processes.
