News Article
Jordan Valley among the 50 fastest growing companies in Israel
Deloitte Technology Israel Fast 50 has acknowledged the company which manufactures X-ray equipment used to characterise gallium arsenide, gallium nitride and indium phosphide wafers.
Jordan Valley Semiconductors (JVS), a provider of X-ray metrology solutions for the global semiconductors industry has been named one of the 2011 Deloitte Israel Technology Fast 50, the ranking of the 50 fastest growing technology companies in Israel. Rankings are based on percentage of fiscal year revenue growth over five years.
"Since the Deloitte Brightman Almagor Zohar Fast 50 award measures sustained revenue growth over five years, being one of the 50 fastest growing technology companies in Israel is an impressive achievement", said Tal Chen, partner in charge of the Deloitte Brightman Almagor Zohar Israel Technology Fast 50 Program. "Jordan Valley deserves a lot of credit for its remarkable growth."
"Jordan Valley is extremely proud to be named to the Fast 50 list, for the 4th time in the last 6 years" says Isaac Mazor, Jordan Valley founder and CEO. "Our growth is a testament to our entire organization's commitment to technological superiority and to the wide adaptation of our x-ray metrology into the advanced semiconductor manufacturing processes as well as other emerging markets such as the LED and compound semiconductors."
The JVX6200i advanced X-ray metrology system is a high throughput, high uptime and low Cost of ownership production tool. It is a multi-channel metrology tool for advanced semiconductors FEOL and BEOL processes as well as wafer-level packaging (WLP) applications. The popular configuration combines X-ray fluorescence (XRF) and X-ray reflectance (XRR). Typical applications are: FEOL (High-k/metal gate, SiON and ACL hard masks), BEOL (Cu seed/barrier, Cu electroplating & CMP) and WLP (UBM stack, Sn/Ag micro bumps and Cu pillars).
The JVX7200 advanced X-ray metrology system is the first in-line production control tool for epitaxial SiGe &Si:C applications. This tool combines Fast HRXRD and Fast XRR channels, capable of measuring SiGe composition, thickness, density, strain and relaxation of single and multi-layer stacks on product wafers with high throughput, accuracy and repeatability. Unlike optical or spectroscopic tools HRXRD and XRR are first principle techniques that deliver accurate and precise results without calibration.
The QC3 / QC-Velox are High Resolution X-Ray Diffractometers (HRXRD) especially designed for production in-line quality control for the compound Semi markets such as LED, Photovoltaic, CPV, Power Transistors, RF and others.
The tools are designed for epitaxial thin-film materials analysis, measuring thickness, composition and relaxation of epilayers such as GaN, GaAs, InP, MQW, silicon, germanium & others. QC-Velox demonstrates the best cost-performance ratio with outstanding throughput, competitive price and low cost of ownership.
