News Article
OIPT releases White Paper on ion beam etching
The publication considers the main applications and advantages of using ion beam etch technology for etching processes when compared to technologies such as plasma etching.
As one of the leaders in Ion Beam technology and system manufacture, Oxford Instruments Plasma Technology's Applications and Technology teams regularly produce technical White Papers, and the latest, on Ion Beam Etching, is now available.
Authored by Sebastien Pochon and Dave Pearson, Senior Ion Beam Application and Technology Specialists at the company, the White Paper presents a review of Ion Beam Etch Technology. It considers the main applications and advantages of using this technology for etching processes when compared to technology such as plasma etching. An overview of how an ion beam is generated is first described, and is then followed by a presentation and discussion of the process applications of ion beam technology.
The white paper is available by contacting Oxford Instruments, at process.news@oxinst.com.
Comments Robert Gunn, Applications Team Manager at Oxford Instruments Plasma Technology, “In order to offer the very best in ion beam and plasma systems, our experienced teams of applications engineers and technologists continue to develop and research into their areas of expertise, and as a result we offer our customers many technical papers, such as this White Paper, in addition to a process library of over 6000 recipes.”
Oxford Instruments’ range of ion beam tools includes the Ionfab300Plus offering the flexibility to perform etch and/or deposition while maximising system utilisation, the Ionfab500Plus designed for ultrahigh quality optical thin films, and the Optofab3000, specifically developed for high quality optical applications.
