News Article
Oxford Instruments promotes Dan Ayres to Managing Director
The promotion aims to ensure that the firm aligns more effectively with its customers and the provision of high technology products and services geared to their specific requirements
Oxford Instruments Plasma Technology has appointed Dan Ayres to Managing Director with immediate effect.
Dan Ayres, Managing Director, Oxford Instruments Plasma Technology
Ayres previously held the position of General Manager at the company, and prior to this was Operations Director. With over 10 years experience within the Oxford Instruments Group, Ayres has held roles in the fields of Operations, Product Management and Project Management.
Dan Ayres will report to Jonathan Flint, CEO of Oxford Instruments plc, who comments, “Our business strategy demands an organisation that can meet the challenge of expanding markets, new products, and growing numbers of customers and employees. Dan’s new appointment will ensure that Oxford Instruments Plasma Technology continues its current growth plans, and I am confident that with Dan heading the strong Executive Team in place at the company, this will be achieved.”
“I am delighted to have this opportunity to lead our highly skilled team and I look forward to working with them to build on the success of recent years”, comments Dan Ayres, “In line with our strategic plan we will focus on innovating improved etch, deposition and growth solutions to meet our customers’ needs for new systems, continuous performance improvement and after-sales support. We will support our focus on innovation by investing in improved business processes to ensure we deliver a healthy and growing business for our employees, shareholders and other stakeholders”
Mark Vosloo, Sales, CS & Marketing Director, Oxford Instruments Plasma Technology
At the same time, Mark Vosloo, Sales & Customer Support Director has taken over responsibility for all customer facing functions including strategic marketing and holds the new title Sales, CS & Marketing Director.
